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Fatigue Degradation of Nanometer-Scale Silicon Dioxide Reaction Layers on Silicon Structural Films — Christopher L. Muhlstein (2003) | RDL Network
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Fatigue Degradation of Nanometer-Scale Silicon Dioxide Reaction Layers on Silicon Structural Films
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Robert O. Ritchie
University of California, Berkeley
Fatigue Degradation of Nanometer-Scale Silicon Dioxide Reaction Layers on Silicon Structural Films
MRS Proceedings 778
Article
2003
English
Authors
CM
Christopher L. Muhlstein
ES
E.A. Stach
Robert O. Ritchie
University of California, Berkeley
Abstract
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