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Fatigue Degradation of Nanometer-Scale Silicon Dioxide Reaction Layers on Silicon Structural Films — Christopher L. Muhlstein (2003) | RDL Network
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Fatigue Degradation of Nanometer-Scale Silicon Dioxide Reaction Layers on Silicon Structural Films
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Robert O. Ritchie
University of California, Berkeley
Fatigue Degradation of Nanometer-Scale Silicon Dioxide Reaction Layers on Silicon Structural Films
MRS Proceedings 778
Article
2003
English
Authors
CM
Christopher L. Muhlstein
ES
E.A. Stach
Robert O. Ritchie
University of California, Berkeley
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