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Fabrication of SOI structure with AlN film as buried insulator by Ion-Cut process — Chuanling Men (2002) | RDL Network
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Fabrication of SOI structure with AlN film as buried insulator by Ion-Cut process
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Paul Kim Ho Chu
Fabrication of SOI structure with AlN film as buried insulator by Ion-Cut process
Article
2002
en
Authors
+4 more
CM
Chuanling Men
XZ
Xu Zheng
ZA
Zhenghua An
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