Skip to content
RDL
Network
Ekosistem
Uygulama değiştir
EN
Hakkımızda
SSS
Giriş yap
Başla
Fabrication of rutile TiO<sub>2</sub> thin films by low-temperature, bias-assisted cathodic arc deposition and their dielectric properties — Anping Huang (2006) | RDL Network
Back
Cite
Save
Save for later
Share
Home
Publications
Fabrication of rutile TiO<sub>2</sub> thin films by low-temperature, bias-assisted cathodic arc deposition and their dielectric properties
Shared by
Paul Kim Ho Chu
Fabrication of rutile TiO<sub>2</sub> thin films by low-temperature, bias-assisted cathodic arc deposition and their dielectric properties
Article
2006
en
Authors
+3 more
AH
Anping Huang
Paul Kim Ho Chu
LW
Lu Wang
Discussion
(0)
Sign in
to like and join the discussion.
No comments yet. Be the first to comment.
Related publications
Article
2007
Structure and properties of zirconia (ZrO<sub>2</sub>) films fabricated by plasma-assisted cathodic arc deposition
Weifeng Li
,
Xuanyong Liu
,
Anping Huang
,
Paul Kim Ho Chu
Article
2007
Fabrication of highly (1000) oriented textured zinc oxide films by metal cathodic arc and oxygen dual plasma deposition and their optical properties
Yongfeng Mei
,
Ricky K.Y. Fu
,
G. G. Siu
,
Paul Kim Ho Chu
,
Z.M. Li
,
Chen-Fu Yang
,
Weikun Ge
,
Zhiyuan Tang
,
W.Y. Cheung
,
S.P. Wong
Article
2005
Plasma nitridation and microstructure of high-k ZrO2 thin films fabricated by cathodic arc deposition
Anping Huang
,
Ricky K.Y. Fu
,
Paul Kim Ho Chu
,
Lu Wang
,
W.Y. Cheung
,
Jianbin Xu
,
S. P. Wong
Article
2008
Fabrication for multilayered composite thin films by dual-channel vacuum arc deposition
Hua Dai
,
Yao Shen
,
Jing Wang
,
Ming Xu
,
Liuhe Li
,
Xiaoling Li
,
Xun Cai
,
Paul Kim Ho Chu
Article
2007
Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation
Anping Huang
,
Zengfeng Di
,
Ricky K.Y. Fu
,
Paul Kim Ho Chu
Discussion(0)
No comments yet. Be the first to comment.