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Ex situ A.C. impedance studies of oxide film growth on Zircaloys in high temperature/high pressure steam — L. Durand‐Keklikian (1991) | RDL Network
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Ex situ A.C. impedance studies of oxide film growth on Zircaloys in high temperature/high pressure steam
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Digby D Macdonald
University of California, Berkeley
Ex situ A.C. impedance studies of oxide film growth on Zircaloys in high temperature/high pressure steam
Article
1991
en
Authors
LD
L. Durand‐Keklikian
GC
G. Cragnolino
Digby D Macdonald
University of California, Berkeley
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