Effect of tantalum content of titanium oxide film fabricated by magnetron sputtering on the behavior of cultured human umbilical vein endothelial cells (HUVEC)

J.Y. Chen; Y.X. Leng; Xiong Zhang; P. Yang; H. Sun; J. Wang; Guojiang Wan; An Sha Zhao; Nan Huang; Paul Kim Ho Chu

doi:10.1016/j.nimb.2005.08.098

RDLNetworkEkosistem

Hakkımızda SSS

Giriş yap Başla

İnönü Üniversitesi Karşısı
Malatya Teknokent-B No:3/1 İç Kapı No: B26
Battalgazi/Malatya

+90 538 363 3074 info@rawdatalibrary.net

Hakkımızda SSS Gizlilik Şartlar İletişim

Effect of tantalum content of titanium oxide film fabricated by magnetron sputtering on the behavior of cultured human umbilical vein endothelial cells (HUVEC) — J.Y. Chen (2005) | RDL Network

Back

Home
Publications
Effect of tantalum content of titanium oxide film fabricated by magnetron sputtering on the behavior of cultured human umbilical vein endothelial cells (HUVEC)

Shared by

Paul Kim Ho Chu

Effect of tantalum content of titanium oxide film fabricated by magnetron sputtering on the behavior of cultured human umbilical vein endothelial cells (HUVEC)

Article 2005 en

Authors

JC
J.Y. Chen
YL
Y.X. Leng
XZ
Xiong Zhang

Discussion(0)

No comments yet. Be the first to comment.

Publication Info

DOI: 10.1016/j.nimb.2005.08.098
Year: 2005
Published: —
Language: en

Article Details

Volume: 242
Issue: 1-2
Link Of The Paper: https://doi.org/10.1016/j.nimb.2005.08.098

Timeline

Created:June 19, 2026

Related publications

Article2004

Effect of Tantalum Content in Titanium Oxide Film on the Behavior of Cultured Human Umbilical Vein Endothelial Cells (HUVEC)

J. Y. Chen, Y.X. Leng, Ping Yang, Hongqi Sun, Jing Wang, Guojiang Wan, Nan Huang, Paul Kim Ho Chu

Article2006

Behavior of endothelial cells on micro-patterned titanium oxide fabricated by plasma immersion ion implantation and deposition and plasma etching

F.J. Jing, L. Wang, Ricky K.Y. Fu, Y.X. Leng, J.Y. Chen, Nan Huang, Paul Kim Ho Chu

Article2006

Behavior of human umbilical vein endothelial cells on micro-patterned amorphous hydrogenated carbon films produced by plasma immersion ion implantation & deposition and plasma etching

Feng Jing, Nan Huang, L. Wang, Ricky K.Y. Fu, Yongfeng Mei, Y.X. Leng, J.Y. Chen, X.Y. Liu, Paul Kim Ho Chu

Article2011

Surface Nanomechanical Behavior of ZrN and ZrCN Films Deposited on NiTi Shape Memory Alloy by Magnetron Sputtering

Chenglin Chu, Honglin Ji, Chunyu Guo, X.B. Sheng, Yue Dong, Lin Peng, Teng Hu, Paul Kim Ho Chu

Article2018

Investigation of Corrosion Behavior of Ti/TiN Multilayers on Al7075 Deposited by High-Vacuum Magnetron Sputtering in 3.5% NaCl Solution

Esfandiar Molavi, Ali Shanaghi, Paul Kim Ho Chu

Effect of tantalum content of titanium oxide film fabricated by magnetron sputtering on the behavior of cultured human umbilical vein endothelial cells (HUVEC)

Discussion(0)

Related publications

Effect of Tantalum Content in Titanium Oxide Film on the Behavior of Cultured Human Umbilical Vein Endothelial Cells (HUVEC)

Behavior of endothelial cells on micro-patterned titanium oxide fabricated by plasma immersion ion implantation and deposition and plasma etching

Behavior of human umbilical vein endothelial cells on micro-patterned amorphous hydrogenated carbon films produced by plasma immersion ion implantation &amp; deposition and plasma etching

Surface Nanomechanical Behavior of ZrN and ZrCN Films Deposited on NiTi Shape Memory Alloy by Magnetron Sputtering

Investigation of Corrosion Behavior of Ti/TiN Multilayers on Al7075 Deposited by High-Vacuum Magnetron Sputtering in 3.5% NaCl Solution

Behavior of human umbilical vein endothelial cells on micro-patterned amorphous hydrogenated carbon films produced by plasma immersion ion implantation & deposition and plasma etching