Development of Reactive Ink-Based Silicon Oxide Mask for Replacement of Photolithography in III-V Solar Cell Fabrication — Mary Pat Nicodemus (2024) | RDL Network
Development of Reactive Ink-Based Silicon Oxide Mask for Replacement of Photolithography in III-V Solar Cell Fabrication
Article 2024 English
Authors
MN
Mary Pat Nicodemus
JS
Jennifer Selvidge
TS
Theresa E. Saenz
Abstract
1 min read
The multi-step photolithographic process involves expensive photoactive chemicals and equipment. Eliminating the photolithographic process will significantly re
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