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Designing a Non‐Volatile Imaging Switch for Mass‐Persistent, Chemically Amplified Photolithography: A Model Study. — John M. Klopp (2003) | RDL Network
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Designing a Non‐Volatile Imaging Switch for Mass‐Persistent, Chemically Amplified Photolithography: A Model Study.
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Jean Mj Frechet
University of California, Berkeley
Designing a Non‐Volatile Imaging Switch for Mass‐Persistent, Chemically Amplified Photolithography: A Model Study.
Article
2003
en
Authors
+1 more
JK
John M. Klopp
NB
Nicolas Bensel
ZF
Zachary M. Fresco
Abstract
1 min read
Abstract For Abstract see ChemInform Abstract in Full Text.
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