Dense Al2O3 films prepared by high power impulse magnetron sputtering at pulsed kV bias

Dongjie Yang; Yaoyao Liu; Xiang Zhang; Shu-sheng Chen; Xiaowei Wang; Yu Liao; Xiaokai An; Yanfei Zhao; Lingjie Chen; Suihan Cui; Liangliang Liu; Ricky K.Y. Fu; Paul Kim Ho Chu; Zhongzhen Wu

doi:10.1016/j.tsf.2025.140611

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