Skip to content
RDL
Network
Ekosistem
Uygulama değiştir
EN
Hakkımızda
SSS
Giriş yap
Başla
Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography — David C. Tully (2000) | RDL Network
Back
Cite
Save
Save for later
Share
Home
Publications
Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography
Shared by
Jean Mj Frechet
University of California, Berkeley
Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography
Article
2000
en
Authors
DT
David C. Tully
AT
Alexander R. Trimble
Jean Mj Frechet
University of California, Berkeley
Discussion
(0)
Sign in
to like and join the discussion.
No comments yet. Be the first to comment.
Related publications
Article
2000
Dendrimer-based chemically amplified resists for sub-100-nm lithography
David C. Tully
,
Alexander R. Trimble
,
Jean Mj Frechet
Article
2021
Wet-chemically synthesis of SnO2-doped Ag2O nanostructured materials for sensitive detection of choline by an alternative electrochemical approach
M. M. Alam
,
Abdullah Mohamed Asiri
,
Mohammed M. Rahman
Article
2020
An alternative electrochemical approach for toluene detection with ZnO/MgO/Cr<sub>2</sub>O<sub>3</sub> nanofibers on a glassy carbon electrode for environmental monitoring
M. M. Alam
,
Abdullah Mohamed Asiri
,
Md. Tamez Uddin
,
Mohammed M. Rahman
,
M. A. Islam
Article
2009
A Versatile Approach to Unimolecular Water-Soluble Carriers: ATRP of PEGMA with Hydrophobic Star-Shaped Polymeric Core Molecules as an Alternative for PEGylation
Oana G. Schramm
,
G. M. Pavlov
,
Hannes P. van Erp
,
Michaël A. R. Meier
,
Richard Hoogenboom
,
Ulrich Sigmar Schubert
Article
2018
Self‐Powered Si/CdS Flexible Photodetector with Broadband Response from 325 to 1550 nm Based on Pyro‐phototronic Effect: An Approach for Photosensing below Bandgap Energy
Yejing Dai
,
Xingfu Wang
,
Wenbo Peng
,
Cheng Xu
,
Changsheng Wu
,
Kai Dong
,
Ruiyuan Liu
,
Zhong Lin Wang
.webp)
Discussion(0)
No comments yet. Be the first to comment.