Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films

Chao Chen; Yulu Liu; Hong‐Yan Lu; Zihao Wang; Bowen Zheng; Qian Guo; Jingkuan Xiao; Ping Wang; Wanting Xu; Yulin Han; M Chen; Xiaofan Cai; Jiabei Huang; Yaqing Han; Di Zhang; Renjun Du; Alexander S. Mayorov; Z.-J Li; Shuai Zhang; Yi Huang; Tingting Cheng; Zhaolong Chen; Ronghua Liu; Nujiang Tang; Haibo Ni; Di Wu; Libo Gao; Xiaoxiang Xi; Qiang-Hua Wang; Lei Wang; Konstantin ‘kostya’ Novoselov; Geliang Yu

doi:10.1038/s41467-025-66142-8

Discussion(0)

No comments yet. Be the first to comment.

Related publications

Chapter in a book2003

Chemical Vapor Deposition

Zhong Lin Wang, Yi Liu, Ze Zhang

Article2015

Oxygen-Assisted Chemical Vapor Deposition Growth of Large Single-Crystal and High-Quality Monolayer MoS<sub>2</sub>

Wei Chen, Jing Zhao, Jing Zhang, Lin Gu, Zhenzhong Yang, Xiaomin Li, Hua Yu, Xuetao Zhu, Rong Yang, Dongxia Shi, Xuechun Lin, Jiandong Guo, Xuedong Bai, Guangyu Zhang

Article2025

Dual-Step Chemical Treatment of Wafer-Scale Metal–Organic Chemical Vapor Deposition Grown Monolayer Molybdenum Disulfides

Juhwan Lim, Anh Tuấn Hoàng, Zhaojun Li, Tran Thi Ngoc Van, Jung-In Lee, Kihyun Lee, Nicolas Gauriot, Kyle Frohna, Takashi Taniguchi, Kenji Watanabe, Bonggeun Shong, Kwanpyo Kim, Samuel D. Stranks, Jong‐Hyun Ahn, Manish Chhowalla, Akshay Rao

Article1994

Growth of Epitaxial BaTiO<sub>3</sub> Thin Films at 600°C by Metalorganic Chemical Vapor Deposition

Debra L. Kaiser, Mark D. Vaudin, L. D. Rotter, Zhong Lin Wang, James P. Cline, Cheol Seong Hwang, Ryna B. Marinenko, John G. Gillen

Article1994

Ellipsometric Investigation of Metal-Organic Chemical Vapor Deposition of Niobium Oxide Films

Tobias Gerfin, Michael Graetzel