Atomistic Simulation of Si3N4 CVD from Dichlorosilane and NH3

A. A. Bagatur’yants; Airat Kh. Minushev; Konstantin ‘kostya’ Novoselov; А. А. Сафонов; S. Ya. Umanskii; A. S. Vladimirov; Anatoli Korkin

doi:10.1007/978-3-662-09432-7_8

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