Application of TOF-SIMS to microelectronics

Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a powerful tool for the study of surface chemical contamination. State-of-the-art TOF-SIMS instruments are capable of detection limits in the ppm regime and spatial resolution on the order of 200 nm. This technique is particularly useful for organic studies and depth profiling of shallow structures. Several recent examples will be discussed.