Concept and basic principle of static process contro(lSPC)and their application in etching process in the microcircuit fabrication are introduced.The difference between hidden exponents of the processing ability and actual exponents of the processing ability and the normal calculation method of the bilateral specification are all presented in detail.Meanwhile,the judgment regulations of exponents of the processing ability during the actual processing are given.Usage of SPC in monitoring the machine working status during etching process and its application of the content and the style in the main process are all studied.How to establish SPC controlgraph,how to collect the parameters,how to choose the graph and how to evaluate the process capability are all discussed here.Furthermore,the analysis methods of abnormity points which appeared during etching process are illustrated by showing an example.
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