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Application of Filtered Pulsed Vacuum Arc Plasma to Deposited AlN and Al2O3 Thin Films — Qingyu Zhang (2000) | RDL Network
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Application of Filtered Pulsed Vacuum Arc Plasma to Deposited AlN and Al2O3 Thin Films
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Paul Kim Ho Chu
Application of Filtered Pulsed Vacuum Arc Plasma to Deposited AlN and Al2O3 Thin Films
Article
2000
en
Authors
+3 more
QZ
Qingyu Zhang
LW
Lu Wang
XT
Xiaobao Tian
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