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An advance plasma surface technology to promote hydroxyapatite formation and suppress nickel leaching in nitinol — C.Y. Chung (2008) | RDL Network
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An advance plasma surface technology to promote hydroxyapatite formation and suppress nickel leaching in nitinol
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Paul Kim Ho Chu
An advance plasma surface technology to promote hydroxyapatite formation and suppress nickel leaching in nitinol
Article
2008
en
Authors
+9 more
CC
C.Y. Chung
Paul Kim Ho Chu
KC
Kmc Cheung
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