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All-water-based electron-beam lithography using silk as a resist — Sunghwan Kim (2014) | RDL Network
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All-water-based electron-beam lithography using silk as a resist
DK
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David Kaplan
All-water-based electron-beam lithography using silk as a resist
Article
2014
en
Authors
+6 more
SK
Sunghwan Kim
BM
Benedetto Marelli
MB
Mark A. Brenckle
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