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This paper reports the characterisation of chemical conversion layers on aluminium by means of Electrochemical Impedance Spectroscopy. To fit the EIS spectra non-trivial dispersion phenomena, which are usually described by means of a constant phase element taking into account fractal dimensions or porosity effects, have to be considered. By investigating the influence of the nature and the conductivity of the EIS electrolyte on the impedance behaviour, the observed dispersion can be attributed to a ladder-network of electrolyte resistances and double layer capacitors in the pores. The proposed electric equivalent circuit allows to study the growth of the film as a function of the conversion parameters. In this paper the influence of the conversion time on the film thickness is worked out. In agreement with AES, SE and FTIRS the layer growth is in proportion to the conversion time.
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Polycrystalline thin films have been grown on gold substrates by electrodeposition, leading to different film compositions. In particular, our conditions allow growing smooth and shiny surface films in a thickness range of nanometers to micrometers. In this article, electroplated layers were analysed by InfraRed Spectroscopic ellipsometry. The dielectric functions have been obtained from ellipsometry analyses using the Drude and Tauc‐Lorentz models. We attributed the scattering distribution of the mobility with the carrier concentration to the presence of grain boundaries in the films. The energy bandgap appears to be constant whatever the carrier concentration. This result can be interpreted by bandgap shrinkage that occurs simultaneously with bandgap widening. These results were supported by additional Hall Effect Measurements. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)